PRESSURE FACTORS AT WORK AND CAREER COMMITMENT: A STUDY WITH IT PROFESSIONALS

Zélia Miranda Kilimnik, Sheila Mara Oliveira Dias, George Leal Jamil
DOI: https://doi.org/10.5329/RESI.2012.1102007

Abstract

This study investigates the pressure factors that most affect information technology (IT) professionals and their influence on their career commitment, as well as the willingness to abandon it. The following scales were used: Pressure Factors at Work adapted from the Occupational Stress Indicator (OSI), proposed by Cooper, Sloan and Williams (1988), Career Commitment, proposed by Blau (1985) and Propensity to Abandon Career, in a sample of 413 professionals. The results indicate that 73% of the surveyed professionals perceive high pressure in their daily routine, especially with respect to indicators that evaluate the relationship between professional and personal life, workload and the prospect of career growth. A negative correlation, although not very high, was found between perceived pressure and career commitment, explaining the fact that 48% of the respondents showed high commitment to the career, in spite of the high load pressure at work. IT professionals, consider abandoning the career, due to the high pressure, but eventually choose to just change job or company, given their commitment to the career and also the favorable conditions, in terms of labor market . It was also identified that IT professionals tend to use the planning of their activities as a strategy to deal with pressure at work.

Keywords

fatores de pressão no trabalho; comprometimento com a carreira; profissionais de TI


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